Structure and deuterium retention properties of tungsten layers deposited by plasma sputtering in a mixed atmosphere of D2 and He

The influence of the deposition conditions on the surface morphology, crystal structure and deuterium retention of the tungsten layers formed by rf magnetron plasma sputtering in mixed atmosphere of D2, He and Ar, has been carried out. Helium containing deuterated tungsten layers (named He-WDx) on Cu/Si substrate demonstrate serious film damages with zones of cracks, fractures, flaking-off and large surface blisters. However, these kinds of damages do not happen on the He-WDx layers performed on mechanically polished polycrystalline Cu substrates because of larger surface roughness of the substrates. The crystal structure of the W layer greatly changes with the additional He in the layer, and large amounts of defects resulting in lattice expansion and X-diffraction peak broadening were produced in the W crystal. He in the W layer has direct impacts on D retention. Both D and He concentrations vary simultaneously with He fraction, attached negative bias and substrate temperature.