Author/Authors :
Kreter، نويسنده , , A. and Wienhold، نويسنده , , P. and Borodin، نويسنده , , D. and Brezinsek، نويسنده , , S. and Droste، نويسنده , , S. and Hirai، نويسنده , , T. and Kirschner، نويسنده , , A. and Litnovsky، نويسنده , , A. and Philipps، نويسنده , , V. and Pospieszczyk، نويسنده , , A. and Samm، نويسنده , , U. and Schmitz، نويسنده , , O. and Sergienko، نويسنده , , G.، نويسنده ,
Abstract :
13CH4 was injected through an aperture in a roof-like test limiter covered by a graphite, tungsten or molybdenum plate during Ohmic discharges. The evolution of the deposition pattern was studied by in situ reflectometry during each plasma pulse. Amounts of locally deposited 13C and co-deposited background 12C in each shot were determined post-mortem. The 13C deposition efficiency is in a range of 0.05–0.2% and grows with the increasing amount of 12C. For the same 12C content the efficiency is of 0.11% for tungsten, 0.14% for molybdenum and 0.17% for graphite.
Keywords :
Amorphous films , Carbon-based materials , First wall , High-Z material , Molybdenum , sputtering , Surface Analysis , TEXTOR , Tracer materials , Tungsten , Erosion and deposition
