Author/Authors :
Sakamoto، نويسنده , , M. and Ogawa، نويسنده , , M. and Zushi، نويسنده , , H. and Higashijima، نويسنده , , A. and Nakashima، نويسنده , , H. and Kawasaki، نويسنده , , S. and Hasegawa، نويسنده , , M. and Idei، نويسنده , , H. and Hanada، نويسنده , , K. and Nakamura، نويسنده , , K. and Sato، نويسنده , , K.N.، نويسنده ,
Abstract :
An in situ and real time measurement system of erosion and deposition has been developed, which is based on interference of light on a thin semi-transparent layer of redeposited material on substrate. It has been applied to long duration discharges in TRIAM-1M. The sapphire window is used as substrate. The deposition pattern on the window indicates up down and toroidal asymmetry. In the 5 h 16 min discharge, the thickness of the deposited layer increased monotonically with time and its deposition rate is ∼1.5 × 1016 Mo m−2 s−1. In the low density and long duration discharge, the Mo deposition rate on the window depends on the ratio of Mo flux to hydrogen flux.
Keywords :
sputtering , High-Z material , TRIAM-1M , Redeposition , Erosion/deposition
