Hydrogen trapping in depositing carbon films

The paper presents results of the experiments devoted to investigation of hydrogen trapping in deposited carbon films under various implantation conditions (residual gas, hydrogen atmosphere, accompanying plasma irradiation). Effect of consequent deuterium irradiation on hydrogen trapping is also studied. Influence of such deposition parameters as deposition rate, residual gas pressure, hydrogen pressure, plasma ions energy, substrate material on hydrogen trapping is discussed. A conclusion about trapping mechanism in growing carbon layers is made.