Title of article
Low frequency Raman scattering of amorphous Ge1−xSx (0⩽x⩽0.62)
Author/Authors
Ogura، نويسنده , , H and Matsuishi، نويسنده , , K and Onari، نويسنده , , S، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
973
To page
977
Abstract
Amorphous Ge1−xSx (0.0⩽x⩽0.62) films were prepared by a laser ablation method, and their low frequency Raman scattering spectra were measured at 20 K. Two distinct vibration regimes were observed in the spectra. In the regime at higher frequencies, the power-law dependence of the reduced Raman intensity (I∝ωt) changes with an increase in x for x>0.2 in such a way that t increases from 1.4 to 1.7 as x increases from 0.2 to 0.62. By applying a fracton model, the fractal dimension is found to decrease with an increase in x over the range 0.2⩽x⩽0.62.
Journal title
Journal of Non-Crystalline Solids
Serial Year
2002
Journal title
Journal of Non-Crystalline Solids
Record number
1367563
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