• Title of article

    Excitation energy dependence of the photoluminescence band at 2.7 and 4.3 eV in silica glass at low temperature

  • Author/Authors

    Sakurai، نويسنده , , Yuryo and Nagasawa، نويسنده , , Kaya، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    5
  • From page
    189
  • To page
    193
  • Abstract
    In this paper, we report the excitation energy dependence of the 2.7 and 4.3 eV photoluminescence (PL) bands in oxygen deficient silica glass at low temperature (∼20 K). The increase or decrease of the PL intensity at low temperatures is different for different exciting light wavelengths. The PL intensity tended to decrease with low temperatures when the excitation was near the upper and lower end of the excited level. The peak energy of the excitation spectrum increases with cooling. These results indicate that the change in excitation level with cooling is associated with the low-temperature dependence of light emission. Thermal motion is suppressed, when the sample temperature is lowered, and the energy-width of the excited level decreases, i.e., the light emission probability decreases (the emission intensity decreases), when near the upper and lower end of the excitation level. These phenomena were observed in the low-temperature dependence of the 4.3 eV emission intensity.
  • Journal title
    Journal of Non-Crystalline Solids
  • Serial Year
    2001
  • Journal title
    Journal of Non-Crystalline Solids
  • Record number

    1368158