Title of article
Excitation energy dependence of the photoluminescence band at 2.7 and 4.3 eV in silica glass at low temperature
Author/Authors
Sakurai، نويسنده , , Yuryo and Nagasawa، نويسنده , , Kaya، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
5
From page
189
To page
193
Abstract
In this paper, we report the excitation energy dependence of the 2.7 and 4.3 eV photoluminescence (PL) bands in oxygen deficient silica glass at low temperature (∼20 K). The increase or decrease of the PL intensity at low temperatures is different for different exciting light wavelengths. The PL intensity tended to decrease with low temperatures when the excitation was near the upper and lower end of the excited level. The peak energy of the excitation spectrum increases with cooling. These results indicate that the change in excitation level with cooling is associated with the low-temperature dependence of light emission. Thermal motion is suppressed, when the sample temperature is lowered, and the energy-width of the excited level decreases, i.e., the light emission probability decreases (the emission intensity decreases), when near the upper and lower end of the excitation level. These phenomena were observed in the low-temperature dependence of the 4.3 eV emission intensity.
Journal title
Journal of Non-Crystalline Solids
Serial Year
2001
Journal title
Journal of Non-Crystalline Solids
Record number
1368158
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