Megawatt laser photolysis of trimethyl(vinyloxy)silane: formation of nano-sized cross-linked polyoxocarbosilane with superior thermal stability

Megawatt ArF laser-induced photolysis of gaseous trimethyl(vinyloxy)silane (TMVSi) results in chemical vapor deposition of solid nano-sized polyoxocarbosilane that is deduced as formed via agglomeration of SiCHnO species (n⩽3). The laser fabricated polymer shows superior thermal stability, contains radical Si centers and is described as a cross-linked polymethyloxocarbosilane consisting of CnSiO4−n (n=0–3) configurations.