Title of article
Megawatt laser photolysis of trimethyl(vinyloxy)silane: formation of nano-sized cross-linked polyoxocarbosilane with superior thermal stability
Author/Authors
Pola، نويسنده , , Josef and Tomovsk?، نويسنده , , Radmila and Bakardjieva، نويسنده , , Snejana and Gal??kov?، نويسنده , , Anna and Vacek، نويسنده , , Karel and Gal??k، نويسنده , , Aftanas، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
10
From page
227
To page
236
Abstract
Megawatt ArF laser-induced photolysis of gaseous trimethyl(vinyloxy)silane (TMVSi) results in chemical vapor deposition of solid nano-sized polyoxocarbosilane that is deduced as formed via agglomeration of SiCHnO species (n⩽3). The laser fabricated polymer shows superior thermal stability, contains radical Si centers and is described as a cross-linked polymethyloxocarbosilane consisting of CnSiO4−n (n=0–3) configurations.
Journal title
Journal of Non-Crystalline Solids
Serial Year
2003
Journal title
Journal of Non-Crystalline Solids
Record number
1368689
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