Title of article
SixGe1−x films and heterojunctions produced by epitaxial crystallization of a-SixGe1−x alloys on GaAs
Author/Authors
Dondeo، نويسنده , , F. and Santos، نويسنده , , P.V. and Kostial، نويسنده , , H. and Krispin، نويسنده , , P. and Pudenzi، نويسنده , , M.A.A. and Chambouleyron، نويسنده , , I.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
4
From page
197
To page
200
Abstract
We studied the structural and electrical properties of crystallized a-SixGe1−x alloys with 0⩽x⩽1 on (1 0 0) GaAs substrates. Raman spectroscopy on laser crystallized films shows the Si–Si, Ge–Ge, and Si–Ge vibrations characteristic of crystalline SixGe1−x alloys. The Raman polarization selection rules indicate that, while SixGe1−x films with x up to 25% are epitaxial, those with higher Si concentrations are polycrystalline with oriented grains. Heterojunctions formed by crystallizing a-Ge films on p-type GaAs exhibit Ohmic behavior. Ge/n-GaAs heterojunctions, in contrast, show rectification with current versus voltage characteristics compatible with the behavior of n–n structures. These heterojunctions are sensitive to light with wavelengths up to 1600 nm, thus demonstrating that they can be used as detectors in the spectral range for optical communications (1300–1550 nm).
Journal title
Journal of Non-Crystalline Solids
Serial Year
2004
Journal title
Journal of Non-Crystalline Solids
Record number
1369147
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