Synthesis, crystal structures and thermal behavior of Ni(pda)(hfac)2 and Ni(pda)(thd)2 as potential MOCVD precursors (pda-1,3-diaminopropane, hfac-1,1,1,5,5,5-hexafluoro-2,4-pentanedionato(-), thd-2,2,6,6-tetrametyl-3,5-heptanedionato(-))

Ni(pda)(hfac)2 (1) and Ni(pda)(thd)2 ( 2) were synthesized and studied as new potential precursors for Metal-Organic Chemical Vapor Deposition (MOCVD). Both crystal structures have been determined by single-crystal X-ray diffraction: compounds are triclinic, space group PView the MathML source1¯, compound (1) has crystal parameters a = 8.5379(4), b = 10.4994(4), c = 11.4186(4) Å, α = 112.091(1), β = 98.385(1), γ = 92.937(1); compound (2) has crystal parameters a = 9.4622(3), b = 11.8986(5), c = 14.1575(6) Å, α = 71.600(1), β = 71.279(1), γ = 88.505(1). These are neutral complexes. Thermal gravimetric analyses (TG/DTA) have shown that both complexes sublime practically without decomposition. Thermodynamic parameters (ΔmpH, ΔmpS) and Tmp of the complexes were determined by differential scanning calorimetry. MOCVD test experiments were carried out at lower pressure using Ni(pda)(hfac)2(1) and Ni(pda)(thd)2 (2) as precursors. The films were grown on Ta/Si substrate and investigated by XRD and SEM.