Title of article
Gas-phase formation of SiSe in IR laser-co-decomposition of dimethyl selenide and 1,3-disilacyclobutane
Author/Authors
Luis D?az، نويسنده , , Magna Santos، نويسنده , , Josef Pola، نويسنده ,
Issue Information
دوفصلنامه با شماره پیاپی سال 2007
Pages
5
From page
3841
To page
3845
Abstract
A LIF excitation spectrum of SiSe obtained upon IR laser irradiation of gaseous mixture of 1,3-disilacyclobutane and dimethyl selenide reveals that the previously reported infrared multiple photon co-decomposition of both compounds involves formation of SiSe. The SiSe formation is explained in terms of reaction of Se atoms with RHSi: silylenes (R = CH3, H) and silene, and elimination of RH from silaneselones (RHSiSe, R = CH3, H).
Keywords
Silicon selenide formation , 1 , Dimethyl selenide , 3-Disilacyclobutane , IR laser-induced co-decomposition , Laser induced fluorescence
Journal title
Journal of Organometallic Chemistry
Serial Year
2007
Journal title
Journal of Organometallic Chemistry
Record number
1377930
Link To Document