Acrylation of polyvinylsilazane with allyl bromide for an UV photosensitive inorganic polymer

A novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by 1H NMR and 2D-1H–1H NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating non-oxide ceramic microstructures using mold free photocuring shaping processes.