Title of article :
Electronic mechanism of thermal destruction of radiation-induced Eʹ-centers in crystalline and glassy SiO2
Author/Authors :
Zatsepin، نويسنده , , A.F.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
4
From page :
1856
To page :
1859
Abstract :
The thermal decay regularities for radiation-induced Eʹ-centers in crystalline and glassy SiO2 were investigated. The results obtained point out that the destruction of Eʹ-centers can be described as ionization process of deep centers in electric field. In terms of used model, the electric field and electron–vibration coupling parameters are sensitive to structural disorder. The most weak electron–phonon coupling in Eʹ-centers is observed for amorphous systems.
Keywords :
Eי-center , Electron–phonon interaction , Electron emission , Destruction mechanism , amorphization , Energy structure
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2011
Journal title :
Journal of Non-Crystalline Solids
Record number :
1380649
Link To Document :
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