Drying kinetics and segregation in a two-component anti-adherent coating studied by photoluminescence and Raman spectroscopies

It is presented a study on the drying kinetics and segregation of a two-component solvent-based polymeric coating containing a silicon-based additive as anti-adherent. For this purpose, micro-Raman spectroscopy was employed with a two fold goal: (i) to study the kinetics of the drying process through the characterization of the fluorescence emission as a function of drying time and, (ii) to analyze the phase segregation between the polymeric resin and the anti-adherent, by using confocal Raman spectroscopy to determine the chemical composition as a function of depth in dry films. The coatings were applied on silicon wafers.