Dielectric properties of bis(2,4 pentanedionato)copper(II) crystalline films grown on Si substrate for low-k applications

Bis(acetylacetonato)copper(II) thin films were prepared by sublimation at about 245 °C in vacuum on p-Si and glass substrates for dielectric and optical investigations. They were characterized by the X-ray diffraction (XRD) and energy-dispersion X-ray fluorescence (EDXRF) methods. The XRD pattern reveals that the prepared films were polycrystalline of monoclinic P21/n structure. The optical absorption spectrum of the prepared film was not identical to that of the molecular one, which identified by a strong absorption peak at 635 nm. The onset energy of the optical absorption of the complex was calculated by using Hamberg et al. method, which is usually used for common solid-state semiconductors and insulators. The dielectric properties for the complex as insulator were investigated on samples made in form of a metal-insulator-semiconductor (MIS) structure. The dielectric properties were studied in frequency range 1–1000 kHz and temperature range 298–333 K. The dielectric relaxation was analyzed in-terms of dielectric modulus M∗(ω). Generally, the present study shows that films of the complex grown on Si substrate are a promising candidate for low-k dielectric applications; it displays low-k value around 1.7 ± 0.1 at high frequencies.