Title of article :
Precise XPS depth profile of soda-lime-silica glass using C60 ion beam
Author/Authors :
Yamamoto، نويسنده , , Yuichi and Yamamoto، نويسنده , , Kiyoshi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
5
From page :
14
To page :
18
Abstract :
Ar ion sputtering is one of the most accepted techniques for depth profiling in practical X-ray photoelectron spectroscopy (XPS) analysis, while this technique is known to be inadequate for quantitative analysis of glass including mobile ions such as soda-lime-silica glass. For the precise depth profiling on XPS depth analysis, three methods, (i) coating of conductive thin film on glass surface, (ii) sample cooling at the temperature of −130 °C and (iii) buckminsterfullerene (C60) ion sputtering, were investigated to suppress the migration of mobile ions in glass. In our best knowledge, it is the first time to succeed the precise XPS depth analysis of soda-lime-silica glass (70.4SiO2, 0.9Al2O3, 7.3MgO, 7.8CaO, 13.6Na2O in mol%) without compositional change by using C60 ion sputtering. The precise analysis revealed that the ion implantation during Ar ion sputtering principally resulted in the compositional change due to the migration of mobile ions.
Keywords :
UPS/XPS , Glass ceramics , Oxide glasses , Alkali silicates , Soda-lime-silica , XPS , Surfaces and interfaces
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2010
Journal title :
Journal of Non-Crystalline Solids
Record number :
1382359
Link To Document :
بازگشت