Photocatalytic TiO2 films prepared by chemical vapor deposition at atmosphere pressure

Nanometer semiconductor titanium dioxide thin films have excellent properties of photocatalysitic degeneration. The glass coated TiO2 films is called self-cleaning glass. In this paper, chemical vapor deposition (CVD) method is employed to deposit TiO2 films on glass. The effect of spacing between nozzle and glass and the effect of substrate temperature on deposition rate are studied. The crystalline structure at different deposition temperatures is analyzed by XRD and anatase was found. And the microstructure of the TiO2 films is also determined by SEM. It shows that the size of crystal grain increases with the temperature.