Title of article
Photocapacitance measurements in irradiated a-Si:H based detectors
Author/Authors
Schwarz، نويسنده , , R. and Mardolcar، نويسنده , , U. and Vygranenko، نويسنده , , Y. and Vieira، نويسنده , , M. and Casteleiro، نويسنده , , C. and Stallinga، نويسنده , , P. and Gomes، نويسنده , , H.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
5
From page
2176
To page
2180
Abstract
Photocapacitance measurements were performed on amorphous silicon p–i–n detectors before and after particle irradiation with 1.5 MeV 4 He+ ions. The spatial resolution across a degraded spot is similar to the one obtained in photocurrent scans and is of the order of the diameter of the scanning laser beam. We monitored the transient capacitance after applying short laser pulses to deduce trap energies of 0.64 eV. Photocapacitance measurements as a function of the applied bias, the measurement frequency up to 1 MHz, and the wavelength of laser light are discussed. The reduction in photocapacitance signal and the shift of the cut-off frequency after ion bombardment are correlated with the change in transport properties.
Keywords
Silicon , Defects , Sensors , radiation
Journal title
Journal of Non-Crystalline Solids
Serial Year
2008
Journal title
Journal of Non-Crystalline Solids
Record number
1382758
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