Title of article :
Future directions for higher-efficiency HIT solar cells using a Thin Silicon Wafer
Author/Authors :
Tohoda، نويسنده , , Satoshi and Fujishima، نويسنده , , Daisuke and Yano، نويسنده , , Ayumu and Ogane، نويسنده , , Akiyoshi and Matsuyama، نويسنده , , Kenta and Nakamura، نويسنده , , Yuya and Tokuoka، نويسنده , , Nozomu and Kanno، نويسنده , , Hiroshi and Kinoshita، نويسنده , , Toshihiro and Sakata، نويسنده , , Hitoshi and Taguchi، نويسنده , , Mikio and Maruyama، نويسنده , , Eiji، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
4
From page :
2219
To page :
2222
Abstract :
To reduce the power generation cost of heterojunction with intrinsic thin layer (HIT) solar cells, it is necessary to use a thinner crystalline silicon wafer, as well as to improve the conversion efficiency. We have experimentally confirmed that VOC of the HIT solar cell increases with decreasing the wafer thickness, and can reach a very high VOC of 747 mV with a 58-μm-thick wafer owing to a sufficiently low surface recombination velocity. We also indicate the future directions for improving the efficiency. The uniformization of the texture size of the silicon surface and reduction of the carrier density in TCO film while maintaining an equal or lower conductivity are effective for improving the optical confinement.
Keywords :
a-Si , c-Si , solar cell , Heterojunction
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2012
Journal title :
Journal of Non-Crystalline Solids
Record number :
1383688
Link To Document :
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