Title of article :
Properties and doping limits of amorphous oxide semiconductors
Author/Authors :
Robertson، نويسنده , , John، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
6
From page :
2437
To page :
2442
Abstract :
The paper reviews our understanding of the conduction, localisation, instability and doping properties of amorphous oxide semiconductors. Amorphous oxide semiconductors (AOSs) are characterized by a larger Bohr radius than a-Si:H, so that the density of states at the mobility edge is much lower than in a-Si:H. Combined with a sharper conduction band tail, this leads to a much small total density of tail states in AOSs, leading to a sharper turn-on characteristic for their thin film transistors. The band gaps of most semiconducting oxides are wide, which is valuable for transparent electronics, but means that they are unlikely to be bipolar dopable, reducing their prospects for solar cells.
Keywords :
Amorphous oxide semiconductor , Mobility edge , Tail states , Doping , Thin film transistor
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2012
Journal title :
Journal of Non-Crystalline Solids
Record number :
1383735
Link To Document :
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