Title of article :
On the transient amorphous silicon structures during solid phase crystallization
Author/Authors :
Law، نويسنده , , F. and Hidayat، نويسنده , , H. and Kumar، نويسنده , , A. and Widenborg، نويسنده , , P. and Luther، نويسنده , , J. and Hoex، نويسنده , , B.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Pages :
6
From page :
172
To page :
177
Abstract :
By analyzing the solid phase crystallization (SPC) of amorphous silicon (a-Si) with the Johnson-Mehl-Avrami-Kolmogorov (JMAK) model, it was found that the crystallization kinetics was non-ideal, with indications of a non-constant nucleation rate. Detailed structural analysis of the a-Si material during SPC revealed an increasing bond angle distortion from the ideal crystalline silicon (c-Si) bond angle of 109.5°. In addition, infrared measurements indicated a change in SiSi bond polarizability, however its role in the SPC behavior is not clear. The increase in tensile stress, bond angle deviation and bond polarizability together with the increase in crystal fraction may suggest that these parameters could be correlated.
Keywords :
Solid phase crystallization , Raman spectroscopy , Fourier transform infrared spectroscopy , amorphous silicon , In-situ X-ray diffraction
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2013
Journal title :
Journal of Non-Crystalline Solids
Record number :
1383930
Link To Document :
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