Deposition of Al doped ZnO thin films on the different substrates with radio frequency magnetron sputtering

This work focuses on fabrication, characterization and understanding of the physical properties of transparent and conductive Al–Zn alloy thin films. Films were deposited onto glass slides, polyethylene terephthalate (PET) and silicon by radio-frequency (RF) reactive magnetron sputtering technique, using Al–Zn alloy targets. In order to generate oxidation process of Al–Zn alloys, Ar:O2 gas mixing in (5:5) ratio was used. Transmittances, reflectance, refractive index and thicknesses of AZO films were measured by UV–Vis spectrophotometry and interferometry respectively. Crystallographic properties were investigated by X-ray diffraction (XRD) method. Surface morphologies of produced films were characterized by atomic force microscopy (AFM) and also field emission scanning electron microscopy (FESEM).