Title of article :
Radical depletion model for intensity effects on photopolymerization
Author/Authors :
Tomeckova، نويسنده , , Vladislava and Halloran، نويسنده , , John W.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Abstract :
Photopolymerization behavior of suspensions based on monomers is determined by the curing kinetics of the monomer, the concentration of photoactives such as photoinitiator, inert dye or inhibitor, and the conditions of polymerization such as light intensity. We present a Radical depletion model, an extended Inhibitor exhaustion model, in terms of minimum light intensity that is required for initiation of the photopolymerization. The validity of this model was tested on a series of (meth)acrylate suspensions with varying the photoactives concentration in the intensity range ∼8–40 mW/cm2.
Keywords :
Photopolymerization , Suspension , sio2 , (Meth)acrylates
Journal title :
Journal of the European Ceramic Society
Journal title :
Journal of the European Ceramic Society