Title of article
Investigation of adhesive and frictional behavior of GeSbTe films with AFM/FFM
Author/Authors
Xie، نويسنده , , Guoxin and Ding، نويسنده , , Jianning and Zheng، نويسنده , , Beirong and Xue، نويسنده , , Wei، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2009
Pages
7
From page
183
To page
189
Abstract
Frictional force microscope (FFM) was used to investigate the nanoscale frictional behavior of GeSbTe films deposited by magnetron sputtering. The effects of relative humidity, scanning velocity and surface roughness on friction were taken into account. Besides, the frictional behavior of GeSbTe films with different compositions was analyzed. Experimental results show that the coefficient of friction of GeSbTe films is almost independent of scanning velocity, while the frictional force decreases with increasing velocity. Both the relationship of friction vs. normal load and that of friction vs. RMS keep relatively linear, and the coefficient of friction increases with the increase in RMS. The influence of humidity on adhesion between the tip and the GeSb2Te4 film is more significant than that between the tip and the Ge2Sb2Te5 film.
Keywords
Friction , Adhesion , GeSbTe film , AFM/FFM
Journal title
Tribology International
Serial Year
2009
Journal title
Tribology International
Record number
1425839
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