• Title of article

    Investigation of adhesive and frictional behavior of GeSbTe films with AFM/FFM

  • Author/Authors

    Xie، نويسنده , , Guoxin and Ding، نويسنده , , Jianning and Zheng، نويسنده , , Beirong and Xue، نويسنده , , Wei، نويسنده ,

  • Issue Information
    ماهنامه با شماره پیاپی سال 2009
  • Pages
    7
  • From page
    183
  • To page
    189
  • Abstract
    Frictional force microscope (FFM) was used to investigate the nanoscale frictional behavior of GeSbTe films deposited by magnetron sputtering. The effects of relative humidity, scanning velocity and surface roughness on friction were taken into account. Besides, the frictional behavior of GeSbTe films with different compositions was analyzed. Experimental results show that the coefficient of friction of GeSbTe films is almost independent of scanning velocity, while the frictional force decreases with increasing velocity. Both the relationship of friction vs. normal load and that of friction vs. RMS keep relatively linear, and the coefficient of friction increases with the increase in RMS. The influence of humidity on adhesion between the tip and the GeSb2Te4 film is more significant than that between the tip and the Ge2Sb2Te5 film.
  • Keywords
    Friction , Adhesion , GeSbTe film , AFM/FFM
  • Journal title
    Tribology International
  • Serial Year
    2009
  • Journal title
    Tribology International
  • Record number

    1425839