Title of article
Development of RF magnetron sputtering method to fabricate PZT thin film actuator
Author/Authors
Tsuchiya، نويسنده , , Kazuyoshi and Kitagawa، نويسنده , , Toshiaki and Nakamachi، نويسنده , , Eiji، نويسنده ,
Issue Information
فصلنامه با شماره پیاپی سال 2003
Pages
7
From page
258
To page
264
Abstract
PZT piezoelectric very thin films suitable for a microactuator have been deposited onto Invar alloy substrate using a high-temperature RF magnetron sputtering technique. PZT thin films must be deposited onto conductive substrate for a monomorph or a bimorph actuator. The chemical composition and the crystalline structure of these films were measured by ESCA and XRD, respectively. The chemical composition of PZT deposited stoichiometrically was almost the same as commercially-produced bulk PZT. Crystal planes (1 1 0) and (1 1 1) of PZT perovskite structure were observed in XRD analysis. When the substrate was heated to above 600 °C, SEM revealed only a very small number of pinholes on the surface. A thin (500 nm) film actuator has been characterized by measuring the piezoelectric property using a Laser Doppler Vibrograph. It was confirmed that the piezoelectric property has a linear relationship with the grain size, which also increased with the substrate temperature. The piezoelectric property of deposited PZT thin films showed a good agreement with a quoted value of bulk PZT, when the substrates were heated to 600 °C.
Keywords
Piezoelectric property , Substrate temperature , grain size , RF magnetron sputtering , PZT
Journal title
Precision Engineering
Serial Year
2003
Journal title
Precision Engineering
Record number
1428852
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