Author/Authors :
Niskanen، نويسنده , , Antti J. and Varpula، نويسنده , , Aapo and Utriainen، نويسنده , , Mikko and Natarajan، نويسنده , , Gomathi and Cameron، نويسنده , , David C. and Novikov، نويسنده , , Sergey and Airaksinen، نويسنده , , Veli-Matti and Sinkkonen، نويسنده , , Juha and Franssila، نويسنده , , Sami، نويسنده ,
Abstract :
We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.
Keywords :
Metal-oxide gas sensor , Microhotplate gas sensor , atomic layer deposition , Tin dioxide
