Orientation and thickness dependence of electrical and gas sensing properties in heteroepitaxial indium tin oxide films

Heteroepitaxial indium tin oxide (ITO) films were grown on three differently oriented yttria-stabilized zirconia (YSZ) substrates ((1 0 0), (1 1 0), (1 1 1)) by rf magnetron sputtering, and their structural characteristics and electrical and gas sensing properties were investigated. The initially formed ITO exhibited an island structure on the very thin layer and became a continuous film after the prolonged deposition. The heteroepitaxial relationships between ITO films and YSZ substrates were confirmed by X-ray diffraction, pole figure, and high resolution transmission electron microscopy (HRTEM). The chemical composition, determined by X-ray photoelectron spectroscopy (XPS), was slightly different at early stage depending on the substrate orientation, but it became similar after the longer deposition. Hall measurements indicated that the electrical resistivity of ITO films decreased with increasing the deposition time (or film thickness) irrespective of the film orientation. The ITO film deposited on (1 1 0) YSZ for 10 s showed the highest electrical resistivity. The gas sensor fabricated from the ITO film on (1 1 0) YSZ deposited for 10 s showed the highest NO2 gas response at relatively low temperature (100 °C), which was attributed to the higher Sn concentration and higher surface roughness of that film.