Selective emitters in buried contact silicon solar cells: Some low-cost solutions

We present the results of our study on the formation of selective emitter structures in buried contact cells. In particular, our attention has been focused on those processes that seem to be scalable to industry. To this aim, specific dopant sources and fabrication steps have been selected. fferent kinds of dopants have been considered: the P-doped SOD and the screen-printed dopant paste. For both sources we have tested the feasibility of the selective diffusion formation in a single step, together with the application of suitable techniques to get selective doping, such as laser enhanced diffusion into the grooves, or selective deposition of screen printed paste in buried grid pattern. SEM and SEM-EBIC analyses have been used to investigate the occurrence of doping. Several batches of buried contact, mechanically grooved cells have prepared and tested.