Author/Authors :
Okamoto، نويسنده , , Shingo and Maruyama، نويسنده , , Eiji and Terakawa، نويسنده , , Akira and Shinohara، نويسنده , , Wataru and Nakano، نويسنده , , Shingo and Hishikawa، نويسنده , , Yoshihiro and Wakisaka، نويسنده , , Kenichiro and Kiyama، نويسنده , , Seiichi، نويسنده ,
Abstract :
This paper reviews recent progress in large-area a-Si/a-SiGe tandem solar cells at Sanyo. Considerable efforts have been devoted to improving both the stabilized efficiency and the production throughput. High-speed patterning using plasma chemical vaporization machining (CVM) has been successfully applied to the a-Si patterning of a 1200 cm2 a-Si integrated-type submodule. The optimization of the hydrogen dilution has led to a high stabilized efficiency of 9.2% for a 1200 cm2 a-Si/a-SiGe tandem submodule whose photovoltaic layers are deposited at 3 إ/s. A scale-up of the submodule size from 1200 to 5400 cm2 is now being done in a pilot plant, which has been operating since April 1999.
Keywords :
High-rate deposition , tandem , amorphous silicon , solar cells , Germanium
