Title of article :
Cost effective and high-performance thin film Si solar cell towards the 21st century
Author/Authors :
Yamamoto، نويسنده , , Kenji and Yoshimi، نويسنده , , Masashi and Tawada، نويسنده , , Yuko and Okamoto، نويسنده , , Yoshifumi and Nakajima، نويسنده , , Akihiko، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
Research and development of thin film Si solar cells are reviewed. By combining a poly-Si cell with an a-Si cell, both of which are fabricated by plasma chemical vapor deposition (CVD) at low temperature, a stabilized efficiency of 12% has been reached for a-Si:H/poly-Si/poly-Si cell structure. A stabilized efficiency of 11.3% has been reached for a 5×5 cm2, 10-segment monolithically series interconnected a-Si/poly-Si tandem cell.
Keywords :
Thin film silicon , Series interconnection , Stacked cell , Plasma chemical vapor deposition
Journal title :
Solar Energy Materials and Solar Cells
Journal title :
Solar Energy Materials and Solar Cells
