Title of article :
Fabrication of thin film nanocrystalline silicon solar cell with low light-induced degradation
Author/Authors :
Chowdhury، نويسنده , , Amartya and Mukhopadhyay، نويسنده , , Sumita and Ray، نويسنده , , Swati، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
7
From page :
597
To page :
603
Abstract :
Nanocrystalline silicon thin films have been deposited at different total gas flow rates and plasma excitation frequencies and samples with similar crystalline volume fraction have been compared. In hydrogenated nanocrystalline silicon solar cells, amorphous component is not necessarily the only determining factor for light-induced degradation. Smaller grain size less than 3 nm diameter and intermediate range order provide a better stability in the i-layer near the p/i interface, thus improving the overall stability of the solar cell. Light-induced degradation (LID) of efficiency of the cell mainly depends on the light-induced degradation of short-circuit current density and light-induced degradation of fill factor (FF). Degradation of open-circuit voltage is less than 1%. Minimum degradation of efficiency obtained in this work is 2%.
Keywords :
solar cell , Raman spectroscopy , Nanocrystalline silicon , Light-induced degradation
Journal title :
Solar Energy Materials and Solar Cells
Serial Year :
2009
Journal title :
Solar Energy Materials and Solar Cells
Record number :
1482491
Link To Document :
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