• Title of article

    Novel separation process for free-standing silicon thin-films

  • Author/Authors

    Willi and Tobail، نويسنده , , O. and Reuter، نويسنده , , M. and Eisele، نويسنده , , S. and Werner، نويسنده , , J.H.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    3
  • From page
    710
  • To page
    712
  • Abstract
    Reduction of the solar cell thickness decreases the material use and offers a mechanically flexible cell. The present contribution introduces a novel method to produce free-standing thin monocrystalline Si layers and solar cells. The method has three advantages over other methods: (i) The device layer is mechanically stable on the host wafer during device fabrication. (ii) Nevertheless, the separation of the layer is guaranteed after the device fabrication. (iii) No foreign substrate is necessary for the layer separation. The method is based on the locally defined formation of buried cavities only beneath the regions to be separated from the host wafer.
  • Keywords
    Layer transfer , Selective etching , Porous Si
  • Journal title
    Solar Energy Materials and Solar Cells
  • Serial Year
    2009
  • Journal title
    Solar Energy Materials and Solar Cells
  • Record number

    1482576