Maskless deposition of ZnO films

Maskless Mesoscale Materials Deposition (M3DTM) is a new direct write technique, which is versatile enough to deposit a large variety of precursors and colloidal suspensions. It is a simple and convenient process for rapid prototyping of structures and components. This maskless deposition method operates in air and at room temperature. In this study, a glycerol based polymeric precursor was used for depositing ZnO thin films on surface modified glass substrates. The parameters for deposition using M3DTM were thoroughly examined and optimized.