Incorporation and critical concentration of oxygen in a-Si:H solar cells

For different process conditions, series of hydrogenated amorphous silicon p-i-n solar cells with various oxygen concentrations in the intrinsic absorber layer were fabricated by plasma-enhanced chemical vapor deposition at 13.56 MHz using process gas mixtures of SiH4 and H2. Oxygen was introduced into the gas phase during the deposition process by a controllable leak in the chamber wall and the amount of oxygen supply is characterized by the oxygen base pressure pb. It is found that for a certain deposition regime defined by silane and H2 flows, deposition pressure and substrate temperature the oxygen incorporation follows an expected dependence on the ratio pb/rd with rd the deposition rate. This relation is not valid for the comparison of different deposition regimes. A high hydrogen flow is found to reduce the oxygen incorporation strongly. The photovoltaic parameters of the solar cells were measured in the initial state as well as after 1000 h of light-soaking. The critical oxygen concentration (i.e. the upper limit of incorporated oxygen not leading to a decay of the solar cell performance) was determined for each regime in the initial and light-soaked state. For all deposition regimes, the results show no difference in these critical oxygen concentrations for the initial and light-soaked state. The critical oxygen concentration, is found to differ for the different process regimes and turns out to be the highest (approximately 1×1020 cm−3) for the deposition regime with the highest hydrogen flow rate, which interestingly is the regime with the lowest oxygen incorporation at a given pb/rd ratio. This combination makes the regime of high hydrogen gas flow suitable for depositing high-efficiency solar cells at high base pressure.