Title of article :
Improved LDSE processing for the avoidance of overplating yielding 19.2% efficiency on commercial grade crystalline Si solar cell
Author/Authors :
Lee، نويسنده , , Eunjoo and Lee، نويسنده , , Hyunwoo and Choi، نويسنده , , Junyoung and Oh، نويسنده , , Dongjun and Shim، نويسنده , , Jimyung and Cho، نويسنده , , Kyungyeun and Kim، نويسنده , , Jisun and Lee، نويسنده , , Soohong and Hallam، نويسنده , , Brett and Wenham، نويسنده , , Stuart R. and Lee، نويسنده , , Haeseok، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
4
From page :
3592
To page :
3595
Abstract :
A record in laser doped selective emitter (LDSE) solar cells with an efficiency η=19.2% is reported. In this study, we investigate the effect of SiNx films for laser doped selective emitter solar cells with plated front contacts. It is observed that the condition of processes such as silicon nitride and laser doping (LD) is of critical importance prior to light induced plating. If these processes are not performed optimally, localized shunts may form during the light induced plating (LIP) process that then inhibit plating in the surrounding areas. In the previous work an efficiency of 18.3% has been achieved, even though the fill factor was only 74.2% and the cell suffered from additional shunting and shading losses due to overplating. However, in this work, we demonstrate that with the optimization of the PECVD SiNx and metallization processes, cells have reached efficiencies of more than 19% on commercial grade p-type CZ Si substrates.
Keywords :
Silicon , Laser doping , Selective emitter , solar cell , Plating
Journal title :
Solar Energy Materials and Solar Cells
Serial Year :
2011
Journal title :
Solar Energy Materials and Solar Cells
Record number :
1486499
Link To Document :
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