Title of article
A transmission electron microscope study of microstructural development in magnetron-sputtered MoSi2 thin films
Author/Authors
Wang، نويسنده , , X.Y. and Chang، نويسنده , , I.T.H. and Aindow، نويسنده , , M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
11
From page
829
To page
839
Abstract
Transmission electron microscopy has been used to reveal the microstructural development in magnetron-sputtered MoSi2 films. Both 50 nm thick free-standing films and 1 μm thick films on (001)Si exhibited similar microstructures. The as-deposited films were amorphous. Annealing at 700 °C resulted in the crystallisation of heavily faulted, fine, untextured grains of the metastable hexagonal C40 MoSi2 phase. Annealing above 800 °C led to the polymorphic transformation of the C40 phase to the equilibrium tetragonal C11b MoSi2 and D8m Mo5Si3 phases. The C11b grains contained high densities of coherent {112}<111> twins on {110}. It was deduced that the C11b phase was produced from the C40 phase by a massive transformation with coherent growth twins formed by “double positioning” on {110} facets at the advancing transformation front.
Keywords
A. Molybdenum silicides , C. Thin films , B. Phase transformations
Journal title
Intermetallics
Serial Year
2002
Journal title
Intermetallics
Record number
1501163
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