Title of article
Phase field modeling the growth of Ni3Al layer in the β/γ diffusion couple of Ni–Al binary system
Author/Authors
Tang، نويسنده , , Sai and Wang، نويسنده , , Jincheng and Yang، نويسنده , , Gencang and Zhou، نويسنده , , Yaohe، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
5
From page
229
To page
233
Abstract
The growth behavior of Ni3Al phase layer in the β/γ diffusion couple of Ni–Al binary system, including the shape evolution and growth kinetics, have been simulated by using the KKS multiphase field model. Simulation results indicate that, when Ni3Al layer growth is controlled completely by volume diffusion, it could be regarded as parabolic growth. However, if the fast grain boundary diffusion is taken into account, the growth rate of Ni3Al phase is accelerated, and the growth kinetics deviates from parabolic growth, which is consistent with experiments and other simulation results. Simulation results also demonstrate some details of shape evolution of grains, such as the uneven Ni3Al/γ and Ni3Al/β interfaces and the grain boundary migration of Ni3Al grains caused by fast grain boundary diffusion.
Keywords
Phase field method , E. Simulations , based on NiAl , B. Diffusion , A. Nickel aluminides
Journal title
Intermetallics
Serial Year
2011
Journal title
Intermetallics
Record number
1504947
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