Title of article :
Growth mechanism of phases by interdiffusion and atomic mechanism of diffusion in the molybdenum–silicon system
Author/Authors :
Prasad، نويسنده , , S. and Paul، نويسنده , , A.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
10
From page :
1191
To page :
1200
Abstract :
Tracer diffusion coefficients are calculated in different phases in the Mo–Si system from diffusion couple experiments using the data available on thermodynamic parameters. Following, possible atomic diffusion mechanism of the species is discussed based on the crystal structure. Unusual diffusion behaviour is found in the Mo5Si3 and Mo3Si phases, which indicate the nature of defects present on different sublattices. Further the growth mechanism of the phases is discussed and morphological evolution during interdiffusion is explained.
Keywords :
A. Intermetallic , B. Diffusion , D. Defects: point defects , A. Molybdenum silicides
Journal title :
Intermetallics
Serial Year :
2011
Journal title :
Intermetallics
Record number :
1505083
Link To Document :
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