• Title of article

    Diffusion in tungsten silicides

  • Author/Authors

    Roy، نويسنده , , Soumitra and Paul، نويسنده , , Aloke، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2013
  • Pages
    5
  • From page
    83
  • To page
    87
  • Abstract
    Experiments are conducted in the W-Si system to understand the diffusion mechanism of the species. The activation energies from integrated diffusion coefficients are calculated as 152 ± 7 and 301 ± 40 kJ/mol in the WSi2 and W5Si3 phases, respectively. In both the phases, Si has a much higher diffusion rate compared to W. This is not surprising to find in the WSi2 phase, if we consider the number of nearest neighbors for both the elements in the crystal. The diffusion of W in this phase indicates the presence of W antisites. The faster diffusion rate of Si in the W5Si3 phase indicates the presence of higher concentration of vacancies on the Si sublattice compared to W sublattice.
  • Keywords
    A. Intermetallics , B. Diffusion , D. Defects: point defects , miscellaneous
  • Journal title
    Intermetallics
  • Serial Year
    2013
  • Journal title
    Intermetallics
  • Record number

    1505657