Title of article :
Recent developments in fluorine chemistry for microelectronic applications: Some examples at Comurhex
Author/Authors :
Jourdan، نويسنده , , A and Morel، نويسنده , , B، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
High purity fluorides are very important for microelectronic applications. In this article, we have reviewed how to prepare, handle and analyse such products as WF6 and ClF3, respectively, a tungsten precursor for metal interconnects and an efficient cleaning agent. Material choice and passivation coupled with high performance analytical studies are the key factors to maintain the highest required purity. This methodology can be extended to other reactive fluorochemicals.
Keywords :
fluorine , Microelectronic gases , Chlorine trifluoride , Cleaning , Metallization , Tungsten hexafluoride
Journal title :
Journal of Fluorine Chemistry
Journal title :
Journal of Fluorine Chemistry