Title of article
New fluoropolymer materials
Author/Authors
Wood، نويسنده , , Colin D. and Michel، نويسنده , , Udo and Rolland، نويسنده , , Jason P. and DeSimone، نويسنده , , Joseph M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
1671
To page
1676
Abstract
We report the synthesis of two classes of fluoropolymers that could impact several key lithographic techniques; one has potential applications in next generation photolithography (193 nm, 157 nm, and immersion lithography) and the other in lithographic techniques which are emerging as viable alternatives to photolithography for future applications (i.e., soft lithography).
Keywords
NM , 157 , NM , Photoresists , Immersion lithography , Supercritical fluids , Microfluidics , Soft lithography , Dielectrics , NANOTECHNOLOGY , Lithography , 193
Journal title
Journal of Fluorine Chemistry
Serial Year
2004
Journal title
Journal of Fluorine Chemistry
Record number
1608556
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