Micron- and submicron-sized surface patterning of silica glass by LIBWE method

Microstructures with well-defined 1 μm-scale grating and grid patterns were fabricated on the surfaces of silica glass using a laser-induced backside wet etching (LIBWE) method by nanosecond-pulsed KrF excimer laser irradiation through a mask projection system. In the former case, gratings as narrow as 0.75 μm-sized were successfully etched on the glass surface via fine adjustments to the projection system. To investigate the etching mechanisms, formation and propagation of the shockwave and micro-bubbles after laser irradiation, at the interface of the silica glass and the toluene solution, were monitored using time-resolved shadowgraph microscopy, from the front- and side-view directions.