Title of article :
Photoreactivity of diarylnitrone additive/pendant in poly(methyl methacrylate) film and photocontrol of refractive index for this polymer film
Author/Authors :
Tanaka، نويسنده , , Kenta and Shiraishi، نويسنده , , Hiroki and Takayanagi، نويسنده , , Emi and Korechika، نويسنده , , Akiko and Igarashi، نويسنده , , Tetsutaro and Sakurai، نويسنده , , Tadamitsu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
Photoreactivities of hydroxy-substituted diarylnitrones (1a–f) in solution and methyl methacrylate(MMA)-derived polymer film were studied. The methyl group introduced at the ortho-position on the N-aryl benzene ring of 1 (1c–e) was found to exert a great steric effect on the photoreaction pathway to eventually give a different photoproduct distribution. This steric effect also contributed to suppressing a decrease in the refractive index of PMMA polymer film. The irradiation at 366 nm of MMA-derived copolymer film (bearing the diarylnitrone pendants) lowered the refractive index of this film by −Δn = 0.0152, which was much larger than the refractive-index decrease of PMMA polymer film containing 1c–e as additives (−Δn = 0.0017–0.0044).
Keywords :
Refractive index , Photoreactivity , Polymer film , Diarylnitrone , photocontrol
Journal title :
Journal of Photochemistry and Photobiology:A:Chemistry
Journal title :
Journal of Photochemistry and Photobiology:A:Chemistry