UV-induced carbonyl generation with formic acid for sensitive determination of nickel by atomic fluorescence spectrometry

UV-induced carbonyl generation with formic acid is used for gaseous sample introduction into an atomic fluorescence spectrometer for the determination of ultra-trace nickel. Compared with conventional carbonyl generation, no toxic gas CO is involved in this work, and volatile Ni(CO)4 is generated with a single reagent formic acid under the irradiation of UV light (253.7 nm, 15 W). The reaction conditions, including reaction medium, UV irradiation time and reaction temperature, are optimized for the best signal. Under the optimized conditions, a limit of detection of 10 ng L−1 for nickel is obtained without any analyte-pre-concentration, which is comparable to that using in situ trapping technique. Interferences from common transition metal ions, noble metal ions and mineral acids are also investigated. The proposed method is applied to the analysis of three certified reference materials and two organic acid samples for trace nickel, with analytical results in good agreement with certified values or those obtained by electrothermal atomic absorption spectrometry. This is a simple, fairly green and highly sensitive method for ultra-trace nickel determination.