• Title of article

    Atomistic investigation of the Kolmogorov–Johnson–Mehl–Avrami law in electrodeposition process

  • Author/Authors

    Berthier، نويسنده , , F and Legrand، نويسنده , , B and Creuze، نويسنده , , J and Tétot، نويسنده , , R، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    16
  • From page
    37
  • To page
    52
  • Abstract
    The electrosorption of Ag onto single-crystal copper (0 0 1) electrodes is studied by Monte Carlo (MC) simulations. An effective Ising model is employed with energetic parameters derived from N-body tight-binding interatomic potentials. Due to the attractive interactions between adsorbate atoms, the equilibrium isotherms present a first-order phase transition at sufficiently low temperatures. Using a dynamic MC algorithm, we study the kinetics of adsorption following sudden potential steps between the low and high branches of the isotherm. We compare these kinetics to those obtained within a mean-field approximation. The MC kinetics are dominated by nucleation and growth processes and are well described by the Kolmogorov–Johnson–Mehl–Avrami (KJMA) equation. We show how some improvements of the classical nucleation theory allow us to derive the physical quantities appearing in this equation, such as the nucleation and the growth rate, from the energetic parameters of the atomistic model.
  • Keywords
    classical nucleation theory , Tight-binding Ising model , Cu–Ag , Electrodeposition , Monte Carlo simulations
  • Journal title
    Journal of Electroanalytical Chemistry
  • Serial Year
    2004
  • Journal title
    Journal of Electroanalytical Chemistry
  • Record number

    1669697