Title of article
Voltammetry and electrodeposition in the presence of attractive interactions: I. a mean-field approach
Author/Authors
Berthier، نويسنده , , F. and Braems، نويسنده , , I. and Creuze، نويسنده , , J. and Tétot، نويسنده , , R. and Legrand، نويسنده , , B.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
12
From page
365
To page
376
Abstract
We present the voltammograms for electrodeposition when strong attractive interactions exist between the adsorbed atoms. Within the mean-field approximation we provide the characteristics (current density, electrode potential and electrode coverage) of the peak that appears in these voltammograms as a function of the parameters of the kinetic model. For the whole range of the electrode potential sweep rates, we compare the expressions obtained from a Frumkin equilibrium isotherm to the classical results provided by a Langmuir isotherm, i.e., disregarding the interactions. For temperatures greater than the phase separation critical temperature Tc and low sweep rates, accounting for the interactions leads to a large increase of the current density at the peak when T → Tc. For T < Tc these interactions make this dimensionless current density diverge as 1/vb when the sweep rate vb tends to 0.
Keywords
Langmuir isotherm , Voltammetry , Frumkin isotherm , Electrodeposition
Journal title
Journal of Electroanalytical Chemistry
Serial Year
2004
Journal title
Journal of Electroanalytical Chemistry
Record number
1670988
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