Title of article :
Direct Numerical Simulation of an electrolyte deposition under a turbulent flow – A first approach
Author/Authors :
Doche، نويسنده , , O. and Bauer، نويسنده , , F. and Tardu، نويسنده , , S.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
6
From page :
1
To page :
6
Abstract :
Coupling between turbulence, chemical mass transport of a reacting salt and electrochemical transformations at the wall are considered in this paper. This first approach deals with the whole coupled problem wherein the effect of the electrical potential field is assumed to be negligible. Direct Numerical Simulations are performed in a fully developed turbulent channel flow wherein the Karman number is Reτ = 180 and the Schmidt number is 1. The direct simulations that are free of closure schemes allow us to conveniently access to the physics of this complex transport phenomenon. Detailed statistics of the concentration and the flow fields are reported here. We show in particular that, as the ratio of the exchange current density to the salt diffusivity is modified, the concentration field evolves between two asymptotic cases governed either by Neumann or Dirichlet boundary conditions.
Keywords :
Turbulent flow , DNS , Butler–Volmer , mass transport , Electroplating , Electrodeposition
Journal title :
Journal of Electroanalytical Chemistry
Serial Year :
2012
Journal title :
Journal of Electroanalytical Chemistry
Record number :
1675365
Link To Document :
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