• Title of article

    Ligand lability of triethylgallium on GaAs(100)

  • Author/Authors

    McEllistrem، نويسنده , , Marcus T. and Jackson، نويسنده , , Michael S. and Culp، نويسنده , , Robert D. and Ekerdt، نويسنده , , John G.، نويسنده ,

  • Issue Information
    هفته نامه با شماره پیاپی سال 2000
  • Pages
    14
  • From page
    117
  • To page
    130
  • Abstract
    We report direct evidence for dissociative adsorption and recombinative desorption of triethylgallium on GaAs(100). Deuterated and undeuterated triethylgallium were used to investigate two distinct ethyl species produced by chemisorption of triethylgallium on GaAs(100): ethyl ligands bound to the GaAs surface and those in chemisorbed ethylgallium species. Deuterium labeling verified that chemisorbed ethyl ligands exchange at temperatures as low as 205 K, for which the GaAs surface serves as an intermediate adsorption site. Ligand exchange was also observed for physisorbed multilayers of triethylgallium for temperatures at or below 180 K. Ligand labeling experiments were also used to demonstrate that following dissociative adsorption, diethylgallium is the only adsorbed ethylgallium species that can lead to recombinative desorption; decomposition of adsorbed diethylgallium prohibits recombinative desorption. Rapid and continuous ligand exchange on the GaAs surface and walls of the vacuum chamber at temperatures of 300 K and above was also observed.
  • Keywords
    Gallium arsenide , Thermal desorption spectroscopy , Chemisorption , Surface chemical reaction , Low index single crystal surfaces , Isotopic exchange/traces , Single crystal surfaces
  • Journal title
    Surface Science
  • Serial Year
    2000
  • Journal title
    Surface Science
  • Record number

    1677829