Title of article
Ligand lability of triethylgallium on GaAs(100)
Author/Authors
McEllistrem، نويسنده , , Marcus T. and Jackson، نويسنده , , Michael S. and Culp، نويسنده , , Robert D. and Ekerdt، نويسنده , , John G.، نويسنده ,
Issue Information
هفته نامه با شماره پیاپی سال 2000
Pages
14
From page
117
To page
130
Abstract
We report direct evidence for dissociative adsorption and recombinative desorption of triethylgallium on GaAs(100). Deuterated and undeuterated triethylgallium were used to investigate two distinct ethyl species produced by chemisorption of triethylgallium on GaAs(100): ethyl ligands bound to the GaAs surface and those in chemisorbed ethylgallium species. Deuterium labeling verified that chemisorbed ethyl ligands exchange at temperatures as low as 205 K, for which the GaAs surface serves as an intermediate adsorption site. Ligand exchange was also observed for physisorbed multilayers of triethylgallium for temperatures at or below 180 K. Ligand labeling experiments were also used to demonstrate that following dissociative adsorption, diethylgallium is the only adsorbed ethylgallium species that can lead to recombinative desorption; decomposition of adsorbed diethylgallium prohibits recombinative desorption. Rapid and continuous ligand exchange on the GaAs surface and walls of the vacuum chamber at temperatures of 300 K and above was also observed.
Keywords
Gallium arsenide , Thermal desorption spectroscopy , Chemisorption , Surface chemical reaction , Low index single crystal surfaces , Isotopic exchange/traces , Single crystal surfaces
Journal title
Surface Science
Serial Year
2000
Journal title
Surface Science
Record number
1677829
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