Kinetic lattice Monte Carlo simulation of facet growth rate

We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed.