Title of article :
How Si(0 0 1)–4×3-In reconstruction improves the epitaxial quality of InSb films grown on Si(0 0 1) substrates
Author/Authors :
Rao، نويسنده , , B.V. and Atoji، نويسنده , , M. and Li، نويسنده , , D.M. and Tambo، نويسنده , , T. and Tatsuyama، نويسنده , , C.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2001
Abstract :
Direct growth of InSb on Si(0 0 1) substrate is difficult due to 19.3% mismatch between Si and InSb. However, we could grow high-quality InSb films on Si(0 0 1) substrates by predepositing a Si(0 0 1)–4×3-In reconstruction. The present report illustrates how the improvement in the growth is directly related to the 4×3 structure of the In reconstruction and its stability against Sb adsorption. These results clearly show that Sb adsorption does not replace the In(4×3) reconstruction below 300°C.
Keywords :
Silicon , Surface relaxation and reconstruction , Indium antimonide , Scanning tunneling microscopy
Journal title :
Surface Science
Journal title :
Surface Science