Title of article
A theoretic study of the indene adsorption on SiO2 surfaces
Author/Authors
Belelli، نويسنده , , Patricia G and Ferreira، نويسنده , , Mar??a L and Juan، نويسنده , , Alfredo and Damiani، نويسنده , , Daniel E، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
12
From page
61
To page
72
Abstract
We studied the indene adsorption on silica surfaces with or without SiCl4. The analysis was realized by means of a semiempirical molecular orbital method. The results show a high degree of selectivity towards the different points of anchoring on the surface. These depend on the silica plane without treatment, species found on SiO2/SiCl4 and the different ways in which the indene molecule approaches the surface. The more stable adsorptions were found over the silica without SiCl4 treatment.
Keywords
Indene adsorption , Treated SiO2 , SiCl4 , Theoretical study
Journal title
Computational Materials Science
Serial Year
2000
Journal title
Computational Materials Science
Record number
1678421
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